Comparison of metalorganic source gases for Al CVD process : DMAH v.s. DMEAA

3 References
  • MATSUHASHI Hideki
    Research Institute of Electrical Communication, Tohoku University
  • LEE Chang-Hun
    Research Institute of Electrical Communication, Tohoku University
  • MASU Kazuya
    Research Institute of Electrical Communication, Tohoku University
  • TSUBOUCHI Kazuo
    Research Institute of Electrical Communication, Tohoku University

Bibliographic Information

Other Title
  • Al CVDにおけるアルミ有機金属ソースガスの比較

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Description

The superiority of DMAH to DMEAA is investigated from the view point of ULSI manufacturing. Both DMAH and DMEAA have almost the same deposition performances such as the surface morphology or step coverage. However, it has shown that DMAH has the lower activation energy for the reproducibility and the superior chemical stability for safe storage and precise transportation. So that DMAH is superior to DMEAA for the Al CVD technology in ULSI manufacturing.

Journal

  • Technical report of IEICE. SDM

    Technical report of IEICE. SDM 97 (239), 67-71, 1997-08-25

    The Institute of Electronics, Information and Communication Engineers

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Keywords

Details 詳細情報について

  • CRID
    1574231877186411392
  • NII Article ID
    110003309427
  • NII Book ID
    AN10013254
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

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