Nano-gap fabrication by focused ion beam for DNA trapping
説明
Micromachined tweezers having nanometer sized gap was fabricated with a silicon isotropic etching method and a focused ion beam technique. The gap of tweezers fabricated by this process was accomplished to be 15 nm-2 ?m ranges. The validity of this tweezers was demonstrated by trapping DNA molecules. Trapping of bundle of ?-DNA molecules between 100 ?m gap was succeeded.
収録刊行物
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- 2006 International Conference on Microtechnologies in Medicine and Biology
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2006 International Conference on Microtechnologies in Medicine and Biology 271-272, 2006-05-01
IEEE