Mask blank particle inspection in vacuum environments

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The mask blank surface inspection system for the electron beam mask writing system (EB mask writer) has developed. This system, that has the small vacuum chamber attachable to EB mask writer, inspects a mask blank that is just before EB writing in vacuum environments. It can inspect whole area of the 230mm mask at 0.3micrometer sensitivity. It also can perform fast inspection by applying the original scanning algorithm for the laser beam. It has the wide detective range from 0.3 to 2.0 micrometers of particle size. It can distinguish sizes of particles in that range. The auto focus function is most important factor for maintaining the sensitivity.

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