Simulation of polymer deformation for various shaped patterns in thermal nano imprint lithography
説明
In this paper, we review the resist deformation process for various aspect ratio and duty ratio in variation with the initial resist polymer thickness by numerical simulation and experiment.
収録刊行物
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- Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference
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Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference 344-345, 2004-04-23
Japan Soc. of Appl. Phys
