Forming a rounded etched profile by using two-step anisotropic wet etching
説明
We used a numerical simulation system to investigate the use of chemical anisotropic etching to fabricate diaphragm structures with a rounded profile at the edge. The rounded-shape was formed by using a two-step KOH etching procedure. The etched profiles were categorized into five types and their shapes were determined by three parameters: the first etching depth, the second etching depth, and mask offset between the first and second etching steps. According to the simulation results, we made a rounded concaved shape at the periphery of a diaphragm structure in order to reduce the concentration of stress there.
収録刊行物
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- MHS2000. Proceedings of 2000 International Symposium on Micromechatronics and Human Science (Cat. No.00TH8530)
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MHS2000. Proceedings of 2000 International Symposium on Micromechatronics and Human Science (Cat. No.00TH8530) 95-100, 2002-11-11
IEEE
