Improvement of OPC data processing for photomask fabrication
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説明
For common approach for low k 1 -factor process, or just shrink LSI chip size, Optical Proximity effect Correction (OPC) has been getting popular. Though only the OPC effect tends to be discussed at design or wafer process stages, the OPC data processing or OPC photomask writing should be also discussed. Through many experiments with fabricated OPC reticles using many kinds of OPC data, the pursuit of reasonable OPC has been continuing. Then practical design grid for reasonable OPC that will improve data processing, output volume and photomask writing time keeping with regardful OPC effect is discussed.
収録刊行物
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- SPIE Proceedings
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SPIE Proceedings 3748 241-, 1999-08-25
SPIE
