InGaAsP optical device integration on SOI platform by Ar/O<sub>2</sub>plasma assisted bonding

この論文をさがす

説明

The hetero-integration of InGaAsP/InP on highly doped silicon micro wire structure for Si hybrid laser using the plasma assisted direct bonding has been carried out. For strong adhesion, bonding assisted pattern was used for the silicon wire to the InGaAsP/InP layers. The I-V characteristics of the highly doped silicon micro wire to InP/InGaAsP layers are measured and compared to the Si/InP bulk bonding. The improvement of the heterointegration with long time annealing was also discussed and realized the direct current injection from Si wire platforms to compound semiconductor active layer for silicon hybrid laser.

収録刊行物

詳細情報 詳細情報について

  • CRID
    1872272492777893376
  • DOI
    10.1117/12.2008337
  • ISSN
    0277786X
  • データソース種別
    • OpenAIRE

問題の指摘

ページトップへ