Deposition of GaN Films on Glass Substrate and Its Application to UV Electroluminescent Devices

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説明

<jats:title>Abstract</jats:title><jats:p>GaN films were deposited on glass substrates using a compound-source molecular beam epitaxy technique. Electroluminescent devices with a double-insulator structure were also fabricated using the deposited films. When the devices were operated using a sine-wave voltage, one of the emission peaks was located in the UV spectral region. Introducing a small ammonia flow increased the deposition rate.</jats:p>

収録刊行物

  • MRS Proceedings

    MRS Proceedings 743 2002-01-01

    Springer Science and Business Media LLC

詳細情報 詳細情報について

  • CRID
    1872553967982463488
  • DOI
    10.1557/proc-743-l6.31
  • ISSN
    19464274
    02729172
  • データソース種別
    • OpenAIRE

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