Evaporated Fatty Acid Resist Process

DOI

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説明

Double layer resist process using fatty acid and Al was proposed for fine pattern fabrication. Oriented thin films of stearic acid and w-tricosenoic acid were formed on an Al evaporated substrate by evaporation using a furnace with an orifice of a few mm diameter. Electron beam exposure characteristics of the films were studied and 2um L/S pattern was successfully developed by heating the substrate and C12 etching of Al.

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詳細情報 詳細情報について

  • CRID
    1872835442890343936
  • DOI
    10.1117/12.953035
  • ISSN
    0277786X
  • データソース種別
    • OpenAIRE

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