Evaporated Fatty Acid Resist Process
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説明
Double layer resist process using fatty acid and Al was proposed for fine pattern fabrication. Oriented thin films of stearic acid and w-tricosenoic acid were formed on an Al evaporated substrate by evaporation using a furnace with an orifice of a few mm diameter. Electron beam exposure characteristics of the films were studied and 2um L/S pattern was successfully developed by heating the substrate and C12 etching of Al.
収録刊行物
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- SPIE Proceedings
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SPIE Proceedings 1086 238-, 1989-08-22
SPIE