Thermal Stability of Nitrided Si Atomic Layer on Ge(100) Using Low Pressure CVD
Bibliographic Information
- Title
- Thermal Stability of Nitrided Si Atomic Layer on Ge(100) Using Low Pressure CVD
- Author
- N.Akiyama et al.
Journal
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- 2nd Int.Workshop on New Group IV Semiconductor Nanoelectronics, Tohoku Univ., Sendai, Japan, Oct.2-3,2006 No.P-28
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2nd Int.Workshop on New Group IV Semiconductor Nanoelectronics, Tohoku Univ., Sendai, Japan, Oct.2-3,2006 No.P-28 75-76, 2006
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Details 詳細情報について
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- CRID
- 1010000781874555034
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- Article Type
- journal article
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- Data Source
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- KAKEN