[Updated on Apr. 18] Integration of CiNii Articles into CiNii Research

Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

Bibliographic Information

Title
Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
Author
Satoshi Takei and Makoto Hanabata

Journal

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Details

  • CRID
    1010000781910665096
  • Article Type
    journal article
  • Data Source
    • KAKEN

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