Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
書誌事項
- タイトル
- Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
- 著者
- Satoshi Takei and Makoto Hanabata
収録刊行物
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- Appl. Phys. Express
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Appl. Phys. Express 9 056501-, 2016