Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
Bibliographic Information
- Title
- Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
- Author
- Satoshi Takei and Makoto Hanabata
Journal
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- Appl. Phys. Express
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Appl. Phys. Express 9 056501-, 2016
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Details 詳細情報について
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- CRID
- 1010000781910665096
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- Article Type
- journal article
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- Data Source
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- KAKEN