Hexagonality and stacking sequence dependence of etching properties in Cl_2-O_2-SiC system
Bibliographic Information
- Title
- Hexagonality and stacking sequence dependence of etching properties in Cl_2-O_2-SiC system
- Author
- T.Hatayama, 他3名
Journal
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- Mat.Sci.Forum 645巻
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Mat.Sci.Forum 645巻 771-774, 2010
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Details
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- CRID
- 1010000782045205249
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- Article Type
- journal article
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- Data Source
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- KAKEN