[Updated on Apr. 18] Integration of CiNii Articles into CiNii Research

Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma

Bibliographic Information

Title
Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma
Author
Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama

Journal

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Details

  • CRID
    1010000782461392260
  • Article Type
    journal article
  • Data Source
    • KAKEN

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