Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma
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- MATSUTANI Akihiro
- 東京工業大学
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- KOYAMA Fumio
- Tokyo Institute of Technology
Bibliographic Information
- Title
- Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma
- Author
- Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama
Journal
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- Jpn. J. Appl. Phys vol.48,06FE09
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Jpn. J. Appl. Phys vol.48,06FE09 1-3, 2009
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Details 詳細情報について
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- CRID
- 1010000782461392260
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- Article Type
- journal article
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- Data Source
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- KAKEN