Estimation of optimum ion energy for the reduction of resistivity in bias sputtering of ITO thin films
書誌事項
- タイトル
- Estimation of optimum ion energy for the reduction of resistivity in bias sputtering of ITO thin films
- 著者
- K. Ishii, Y. Saitou, K. Furutani, H. Sakuma, Y. Ikeda
収録刊行物
-
- IEICE TRANSACTIONS on Electronics vol. E91-C
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IEICE TRANSACTIONS on Electronics vol. E91-C 1653-1657, 2008