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Evaluation of contribution of higher-order silane radicals in silane discharges to Si-H_2 bond formation in a-Si:H films

Bibliographic Information

Title: Evaluation of contribution of higher-order silane radicals in silane discharges to Si-H_2 bond formation in a-Si:H films

Author: Kazunori Koga, Naoto Kaguchi, Masaharu Shiratani, Yukio Watanabe

Journal

Proceedings of International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources (in press)

Proceedings of International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources (in press) 2004

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Details

CRID

1010282256753462152
Article Type

journal article
Data Source
- KAKEN

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