Evaluation of contribution of higher-order silane radicals in silane discharges to Si-H_2 bond formation in a-Si:H films
書誌事項
- タイトル
- Evaluation of contribution of higher-order silane radicals in silane discharges to Si-H_2 bond formation in a-Si:H films
- 著者
- Kazunori Koga, Naoto Kaguchi, Masaharu Shiratani, Yukio Watanabe
収録刊行物
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- Proceedings of International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources (in press)
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Proceedings of International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources (in press) 2004