Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas

Bibliographic Information

Title
Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas
Author
Hidemitsu Aoki, Takuro Masuzumi, Makoto Hara, Daisuke Watanabe, Chiharu Kimura, Takashi Sugino

Journal

Related Projects

See more

Details 詳細情報について

  • CRID
    1010282257011907845
  • Article Type
    journal article
  • Data Source
    • KAKEN

Report a problem

Back to top