Plasma chemical behaviour of reactants and reaction products during inductively coupled C_F4 plasma Etching of SiO_2
書誌事項
- タイトル
- Plasma chemical behaviour of reactants and reaction products during inductively coupled C_F4 plasma Etching of SiO_2
- 著者
- H.Fukumoto, I.Fujikake, Y.Takao, K.Eriguchi, K.Ono
収録刊行物
-
- Plasma Sources Sci.Technol. Vol. 18, No. 4
-
Plasma Sources Sci.Technol. Vol. 18, No. 4 2009
