Plasma chemical behaviour of reactants and reaction products during inductively coupled C_F4 plasma Etching of SiO_2
Bibliographic Information
- Title
- Plasma chemical behaviour of reactants and reaction products during inductively coupled C_F4 plasma Etching of SiO_2
- Author
- H.Fukumoto, I.Fujikake, Y.Takao, K.Eriguchi, K.Ono
Journal
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- Plasma Sources Sci.Technol. Vol. 18, No. 4
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Plasma Sources Sci.Technol. Vol. 18, No. 4 2009
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Details
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- CRID
- 1010282257047008908
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- Article Type
- journal article
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- Data Source
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- KAKEN