Effect of wafer pre-cleaning and plasma irradiation to wafer surfaces for plasma-assisted surface activated bonding
Bibliographic Information
- Title
- Effect of wafer pre-cleaning and plasma irradiation to wafer surfaces for plasma-assisted surface activated bonding
- Author
- R.Takei, K.Yoshida, T.Mizumoto
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 49 86204-, 2010
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Details 詳細情報について
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- CRID
- 1010282257082189829
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- Article Type
- journal article
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- Data Source
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- KAKEN