Fabrication of Amorphous Silicon Carbide Films from Decomposition of Tetramethylsilane using ECR plasma of Ar
Bibliographic Information
- Title
- Fabrication of Amorphous Silicon Carbide Films from Decomposition of Tetramethylsilane using ECR plasma of Ar
- Author
- H. Ito, S. Onitsuka, R. Gappa, H. Saitoh, R. Roacho, K. H. Pannell, T. Suzuki, M. Niibe,and K. Kanda
Journal
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- J. Phys. Conf. Ser.
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J. Phys. Conf. Ser. (印刷中)
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Details 詳細情報について
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- CRID
- 1010282257097332992
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- Web Site
- http://iopscience.iop.org/1742-6596/
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- Article Type
- journal article
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- Data Source
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- KAKEN