Characteristics of Hot Hole Injection,Trapping, and Detrapping in Gate Oxide of Polycrystalline Silicon Thin-Film Transistors
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- KAMAKURA Yoshinari
- 大阪大学
Bibliographic Information
- Title
- Characteristics of Hot Hole Injection,Trapping, and Detrapping in Gate Oxide of Polycrystalline Silicon Thin-Film Transistors
- Author
- Yoshinari Kamakura, Takashi Himukashi, Hiroshi Tsuji, and Kenji Taniguchi
Journal
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- Jpn. J. Appl. Phys.
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Jpn. J. Appl. Phys. vol. 51, no. 2 2012
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Details 詳細情報について
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- CRID
- 1010282257097842433
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- Article Type
- journal article
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- Data Source
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- KAKEN