Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

Name: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Author: Advances in resist technology and processing, Sturtevant, John L., Society of Photo-optical Instrumentation Engineers, AZ Electronic Materials (USA), Rohm & Haas Company, International SEMATECH

Advances in resist technology and processing, Sturtevant, John L., Society of Photo-optical Instrumentation Engineers, AZ Electronic Materials (USA), Rohm & Haas Company, International SEMATECH

Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

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書誌事項

タイトル: "Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA"

責任表示: John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering.

出版者

SPIE

出版年月

c2005

書籍サイズ: 28 cm

シリーズ名/番号

pt. 1
pt. 2

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注記

Includes bibliographical references and author index

Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

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Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

書誌事項

この図書・雑誌をさがす

注記

関連図書・雑誌

詳細情報 詳細情報について

書き出し

詳細情報詳細情報について