Advanced microlithography technologies : 8-10 November, 2004, Beijing, China

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Bibliographic Information

Title
"Advanced microlithography technologies : 8-10 November, 2004, Beijing, China"
Statement of Responsibility
Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society ... [et al.] ; supporting organizations, National Natural Science Foundation of China ... [et al.]
Publisher
  • SPIE
Publication Year
  • c2005
Book size
28 cm
Other Title
  • Microlithography technologies

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Notes

Includes bibliographical references and author index

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