Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing
書誌事項
- タイトル
- "Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing"
- 責任表示
- editors, S. Raghavan, R.L. Opila, L. Zhang ; Electronics and Dielectric Science and Technology Divisions [of the Electrochemical Society]
- 出版者
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- Electrochemical Society
- 出版年月
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- c1998
- 書籍サイズ
- 23 cm
- タイトル別名
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- Chemical mechanical planarization in integrated circuit device manufacturing
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注記
"Electronics and Dielectric Science and Technology Divisions."
"This volume contains most of the papers presented at the Second International Symposium on Chemical Mechanical Planarization (CMP) in Integrated Circuit (IC) Device Manufacturing held at the 193rd Annual Meeting of Electrochemical Society in San Diego during May 5-7, 1998."
Includes bibliographical references and indexes
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詳細情報 詳細情報について
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- CRID
- 1130000796465148544
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- NII書誌ID
- BA4328413X
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- ISBN
- 156677201X
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- LCCN
- 99196375
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- Web Site
- https://lccn.loc.gov/99196375
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- 本文言語コード
- en
-
- 出版国コード
- us
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- タイトル言語コード
- en
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- 出版地
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- Pennington, N. J.
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- データソース種別
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- CiNii Books