Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

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Bibliographic Information

Title
"Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA"
Statement of Responsibility
Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineer
Publisher
  • SPIE
Publication Year
  • c2000
Book size
28 cm
Series Name / No
  • SET

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Notes

Includes bibliographical references and index

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Details 詳細情報について

  • CRID
    1130000797044318848
  • NII Book ID
    BA60711838
  • ISBN
    0819436178
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Bellingham, Wash.
  • Data Source
    • CiNii Books
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