Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
CiNii
Available at 2 libraries
Bibliographic Information
- Title
- "Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA"
- Statement of Responsibility
- Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineer
- Publisher
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- SPIE
- Publication Year
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- c2000
- Book size
- 28 cm
- Series Name / No
-
- SET
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Notes
Includes bibliographical references and index
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Details 詳細情報について
-
- CRID
- 1130000797044318848
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- NII Book ID
- BA60711838
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- ISBN
- 0819436178
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.
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- Data Source
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- CiNii Books