Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA
Bibliographic Information
- Title
- "Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA"
- Statement of Responsibility
- Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
- Publisher
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- SPIE
- Publication Year
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- c2001
- Book size
- 28 cm
- Series Name / No
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- : set
- Other Title
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- Advances in resist technology and processing 18
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Notes
Includes bibliographical references and author index
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Details 詳細情報について
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- CRID
- 1130003902915151872
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- NII Book ID
- BB29368259
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- ISBN
- 0819440310
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- LCCN
- 2002283519
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- Web Site
- https://lccn.loc.gov/2002283519
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Washington
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- Classification
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- LCC: TR940
- DC21: 621.3815/31
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- Subject
-
- Data Source
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- CiNii Books