Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

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Bibliographic Information

Title
"Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA"
Statement of Responsibility
Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Publisher
  • SPIE
Publication Year
  • c2001
Book size
28 cm
Series Name / No
  • : set
Other Title
  • Advances in resist technology and processing 18

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Notes

Includes bibliographical references and author index

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