Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA
書誌事項
- タイトル
- "Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA"
- 責任表示
- Lars W. Liebmann, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH
- 出版者
-
- SPIE
- 出版年月
-
- c2005
- 書籍サイズ
- 28 cm
この図書・雑誌をさがす
注記
Includes bibliographical references and author index
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1130282270211791744
-
- NII書誌ID
- BA86008236
-
- ISBN
- 0819457361
-
- LCCN
- 2006272389
-
- Web Site
- https://lccn.loc.gov/2006272389
-
- 本文言語コード
- en
-
- 出版国コード
- us
-
- タイトル言語コード
- en
-
- 出版地
-
- Bellingham, Wash.
-
- 件名
-
- LCSH: Integrated circuits -- Design and construction -- Congresses
- LCSH: Integrated circuits -- Defects -- Analysis -- Congresses
- LCSH: Semiconductors -- Design and construction -- Congresses
- LCSH: Semiconductor wafers -- Defects -- Analysis -- Congresses
- LCSH: Microelectronics industry -- Quality control -- Congresses
- LCSH: Quality control -- Congresses
-
- データソース種別
-
- CiNii Books