Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California

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書誌事項

タイトル: "Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California"

責任表示: Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering

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出版年月

"Part of a two-conference program ... held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii

Includes bibliographical references and index