Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California

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Bibliographic Information

Title
"Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California"
Statement of Responsibility
Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics
Publisher
  • S.P.I.E.-- International Society for Optical Engineering
Publication Year
  • c1984
Book size
28 cm
Series Name / No
  • pbk.

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