Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
Bibliographic Information
- Title
- "Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA"
- Statement of Responsibility
- Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH
- Publisher
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- SPIE
- Publication Year
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- c2004
- Book size
- 28 cm
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Notes
Includes bibliographical references and index
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Details 詳細情報について
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- CRID
- 1130282271333075200
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- NII Book ID
- BA86005271
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- ISBN
- 0819452912
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- LCCN
- 2004303114
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- Web Site
- https://lccn.loc.gov/2004303114
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash., USA
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- Data Source
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- CiNii Books