Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

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Bibliographic Information

Title
"Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA"
Statement of Responsibility
Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH
Publisher
  • SPIE
Publication Year
  • c2004
Book size
28 cm

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Notes

Includes bibliographical references and index

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