Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California

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Bibliographic Information

Title
"Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California"
Statement of Responsibility
Phillip D. Blais, chairman/editor
Publisher
  • SPIE--the International Society for Optical Engineering
Publication Year
  • c1986
Book size
28 cm
Series Name / No
  • pbk.
Other Title
  • Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V

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Notes

Includes bibliographies and index

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