Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California

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Bibliographic Information

Title
"Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California"
Statement of Responsibility
Philliip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics
Publisher
  • SPIE--the International Society for Optical Engineering
Publication Year
  • c1985
Book size
28 cm
Series Name / No
  • pbk.

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Notes

Includes bibliographies and index

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