Chemical hole doping into large-area transition metal dichalcogenide monolayers using boron-based oxidant

詳細情報 詳細情報について

• CRID

  1360002221359587072

• NII論文ID

  210000148662

• DOI

  10.7567/jjap.57.02cb15

• ISSN

  13474065

  00214922

• Web Site

  http://stacks.iop.org/1347-4065/57/i=2S2/a=02CB15/pdf

  http://stacks.iop.org/1347-4065/57/i=2S2/a=02CB15?key=crossref.9e79a78998827e8d3b227898a53166d8

• データソース種別

  • Crossref
  • CiNii Articles
  • KAKEN