Chemical hole doping into large-area transition metal dichalcogenide monolayers using boron-based oxidant
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 57 (2S2), 02CB15-, 2018-01-18
IOP Publishing
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詳細情報 詳細情報について
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- CRID
- 1360002221359587072
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- NII論文ID
- 210000148662
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- ISSN
- 13474065
- 00214922
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- データソース種別
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- Crossref
- CiNii Articles
- KAKEN