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Chemical hole doping into large-area transition metal dichalcogenide monolayers using boron-based oxidant

DOI Web Site Web Site 4 Citations 37 References Open Access

Journal

Japanese Journal of Applied Physics

Japanese Journal of Applied Physics 57 (2S2), 02CB15-, 2018-01-18

IOP Publishing

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References(37)*help

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Details

CRID

1360002221359587072
NII Article ID

210000148662
DOI

10.7567/jjap.57.02cb15
ISSN

13474065

00214922
Web Site

http://stacks.iop.org/1347-4065/57/i=2S2/a=02CB15/pdf

http://stacks.iop.org/1347-4065/57/i=2S2/a=02CB15?key=crossref.9e79a78998827e8d3b227898a53166d8
Data Source
- Crossref
- CiNii Articles
- KAKEN

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