Effects of Capacitively Coupled Radio Frequency Krypton and Argon Plasmas on Gallium Nitride Etching Damage
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 48 (8), 08HF01-, 2009-08-20
IOP Publishing
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詳細情報 詳細情報について
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- CRID
- 1360003446854928000
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- NII論文ID
- 210000067284
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/13474065
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- データソース種別
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- Crossref
- CiNii Articles