Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns
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- Tzu-Ling Liu
- Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States
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- Stacey F. Bent
- Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States
収録刊行物
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- Chemistry of Materials
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Chemistry of Materials 33 (2), 513-523, 2021-01-08
American Chemical Society (ACS)
