Experimental study of plasma non-uniformities and the effect of phase-shift control in a very high frequency capacitive discharge

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公開日
2010-02-12
権利情報
  • https://iopscience.iop.org/page/copyright
  • https://iopscience.iop.org/info/page/text-and-data-mining
DOI
  • 10.1088/0022-3727/43/8/085203
公開者
IOP Publishing

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説明

<jats:p>Plasma spatial non-uniformities were studied experimentally in a very high frequency (100 MHz) capacitive triode-type reactor used for etching of 300 mm wafers. It has been shown that in the traditional mode of operation there is considerable plasma non-uniformity due to the electromagnetic effects, namely at a low power, the plasma density profile is determined by the standing-wave effect, while at a high power the skin effect dominates. The influence of phase-shift control on plasma uniformity was examined. Phase-shift control means applying to the top and the bottom electrodes very high frequency voltages with a controlled phase shift between them. The experiments were carried out in process (C<jats:sub>4</jats:sub>F<jats:sub>8</jats:sub>/O<jats:sub>2</jats:sub>/Ar) plasma in a wide range of pressures and powers. It has been shown that the phase-shift control can considerably improve the plasma uniformity under a wide range of experimental conditions.</jats:p>

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