Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by r.f. reactive magnetron sputtering

詳細情報 詳細情報について

• CRID

  1364233268323706880

• NII論文ID

  30006175159

• DOI

  10.1016/s0040-6090(97)01053-5

• ISSN

  00406090

• Web Site

  https://api.elsevier.com/content/article/PII:S0040609097010535?httpAccept=text/xml

  https://api.elsevier.com/content/article/PII:S0040609097010535?httpAccept=text/plain

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