Extremely high aspect ratio GaAs and GaAs/AlGaAs nanowaveguides fabricated using chlorine ICP etching with N₂-promoted passivation

詳細情報 詳細情報について

• CRID

  1364233268454852480

• DOI

  10.1088/0957-4484/21/13/134014

• ISSN

  13616528

  09574484

  http://id.crossref.org/issn/09574484

• Web Site

  http://stacks.iop.org/0957-4484/21/i=13/a=134014/pdf

• データソース種別

  • Crossref