Novel PECVD equipment for Ti thin film deposition utilizing Ar-based plasma and wafer stage impedance control
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- Denpoh
- Creator
Journal
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- Proc. 38th Int. Symp. Dry Process
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Proc. 38th Int. Symp. Dry Process 183-, 2016
Details
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- CRID
- 1371695768507923585
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- Data Source
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- Crossref