Novel PECVD equipment for Ti thin film deposition utilizing Ar-based plasma and wafer stage impedance control
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- Denpoh
- 作成者
収録刊行物
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- Proc. 38th Int. Symp. Dry Process
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Proc. 38th Int. Symp. Dry Process 183-, 2016
詳細情報
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- CRID
- 1371695768507923585
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- データソース種別
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- Crossref