プラズマ重合多層レジストの効果

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書誌事項

タイトル別名
  • An Effect of Plasma Polymerized Multi-Layer Resist
  • プラズマ ジュウゴウ タソウ レジスト ノ コウカ ソクホウ

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説明

The purpose of this paper is to describe a plasma etching characteristic of plasma polymerized multi-layer resist. Plasma polymerized multi-layer resist were formed in multiple flow grow-in after grow reactor. A pattern was delineated in the resist using an electron beam, and it was developed by plasma etching with a mixture of argon and oxygen. It was found that the etching rate of a boundary layer of upper resist and lower resist was smaller than of so on.

収録刊行物

  • 真空

    真空 26 (12), 919-921, 1983

    一般社団法人 日本真空学会

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