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- TAMANO Junji
- Department of Electrical Engineering, Nagoya University
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- ICHIKAWA Masami
- Department of Electrical Engineering, Nagoya University
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- MORITA Shinzo
- Department of Electrical Engineering, Meijo University
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- HATTORI Shuzo
- Department of Electrical Engineering, Nagoya University
Bibliographic Information
- Other Title
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- プラズマ重合多層レジストの効果
- プラズマ ジュウゴウ タソウ レジスト ノ コウカ ソクホウ
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Description
The purpose of this paper is to describe a plasma etching characteristic of plasma polymerized multi-layer resist. Plasma polymerized multi-layer resist were formed in multiple flow grow-in after grow reactor. A pattern was delineated in the resist using an electron beam, and it was developed by plasma etching with a mixture of argon and oxygen. It was found that the etching rate of a boundary layer of upper resist and lower resist was smaller than of so on.
Journal
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- Shinku
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Shinku 26 (12), 919-921, 1983
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001204063109504
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- NII Article ID
- 130000865786
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 2613134
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed