書誌事項
- タイトル別名
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- An Effect of Plasma Polymerized Multi-Layer Resist
- プラズマ ジュウゴウ タソウ レジスト ノ コウカ ソクホウ
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説明
The purpose of this paper is to describe a plasma etching characteristic of plasma polymerized multi-layer resist. Plasma polymerized multi-layer resist were formed in multiple flow grow-in after grow reactor. A pattern was delineated in the resist using an electron beam, and it was developed by plasma etching with a mixture of argon and oxygen. It was found that the etching rate of a boundary layer of upper resist and lower resist was smaller than of so on.
収録刊行物
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- 真空
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真空 26 (12), 919-921, 1983
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001204063109504
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- NII論文ID
- 130000865786
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 2613134
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可