有磁場マイクロ波エッチング装置内壁に入射するイオンのin situ分析

書誌事項

タイトル別名
  • In Situ Analysis of Incident Ions on Chamber Surface in Electron Cyclotron Resonance Etching.
  • ユウジバ マイクロハ エッチング ソウチ ナイヘキ ニ ニュウシャ スル イオン ノ in situ ブンセキ

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抄録

Incident ions on the chamber surface in electron cyclotron resonance plasma were characterized in situ using a quadrupole mass analyzer, which was shielded with an 1-mm-thick cylinder made of highly permeable material. The incident ions were identified as Clx+, BClx+, AlxCly+, CxCly+ and SixCly+. Their incident energy was about 5 eV, as determined by the potential difference at the sheath. The BClx+ incident ions reacted with OH which is abundant on the surface of the quartz cylinder and formed B2O3 as identified by infrared reflection absorption spectroscopy.

収録刊行物

  • 真空

    真空 43 (8), 812-816, 2000

    一般社団法人 日本真空学会

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