書誌事項
- タイトル別名
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- In Situ Analysis of Incident Ions on Chamber Surface in Electron Cyclotron Resonance Etching.
- ユウジバ マイクロハ エッチング ソウチ ナイヘキ ニ ニュウシャ スル イオン ノ in situ ブンセキ
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Incident ions on the chamber surface in electron cyclotron resonance plasma were characterized in situ using a quadrupole mass analyzer, which was shielded with an 1-mm-thick cylinder made of highly permeable material. The incident ions were identified as Clx+, BClx+, AlxCly+, CxCly+ and SixCly+. Their incident energy was about 5 eV, as determined by the potential difference at the sheath. The BClx+ incident ions reacted with OH which is abundant on the surface of the quartz cylinder and formed B2O3 as identified by infrared reflection absorption spectroscopy.
収録刊行物
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- 真空
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真空 43 (8), 812-816, 2000
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001204063518592
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- NII論文ID
- 10004562745
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 5476147
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可