Laser Desorption/Ionization Mass Spectrometry on Porous Silicon and Its Application to Synthetic Polymers

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  • OKUNO Shoji
    Japan Science and Technology Agency, Wada Proteomics Project
  • SHIMOMAE Yukiyasu
    Department of Applied Chemistry, Kansai University
  • WADA Yoshinao
    Osaka Medical Center and Research Institute for Material and Child Health
  • ARAKAWA Ryuichi
    Japan Science and Technology Agency, Wada Proteomics Project Department of Applied Chemistry, Kansai University

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Other Title
  • ポーラスシリコンを用いるレーザー脱離イオン化質量分析の合成高分子への応用
  • ポーラスシリコン オ モチイル レーザー ダツリ イオンカ シツリョウ ブンセキ ノ ゴウセイ コウブンシ エ ノ オウヨウ

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Description

Desorption ionization on silicon (DIOS) is a novel matrix-free variant of laser desorption/ionization (LDI) techniques for mass spectrometry. DIOS sample targets or DIOS chips are produced by the electrochemical etching of silicon wafers under light exposure. In the present report, the optimal conditions regarding the resistivity of a silicon wafer, the etching current density and the etching time, for making DIOS chips with good ionization performance are described. The DIOS mass spectra of various kinds of synthetic polymers are compared with the matrix-assisted LDI (MALDI) mass spectra. In the quantitative analysis of mixtures of diol and triol types of polypropyleneglycol (PPG), DIOS provides more reliable data than MALDI under the optimized conditions. The ionization process in DIOS was studied in terms of the redox reaction of the analytes. Copper(II) chloride, some organic dyes and riboflavin, were reduced and some ferrocene derivatives were oxidized as well as MALDI. These results indicated that electron transfer between the analytes and the chip surface occurred in DIOS. The reduction of riboflavin was accelerated using water as a solvent.<br>

Journal

  • BUNSEKI KAGAKU

    BUNSEKI KAGAKU 54 (6), 439-447, 2005

    The Japan Society for Analytical Chemistry

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