Alignment pattern detection method using diagonal imaging optics for X-ray exposure system.
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- TANIGUCHI Motoya
- 正会員 (株) 日立製作所
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- INAGAKI Akira
- 正会員 (株) 日立製作所
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- KEMBO Yukio
- 正会員 (株) 日立製作所
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- OKAMOTO Keiichi
- (株) 日立製作所
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- FUNATSU Ryuichi
- 正会員 (株) 日立製作所
Bibliographic Information
- Other Title
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- 斜方結像光学系を用いたX線露光装置用アラインメントパターン検出法
- シャホウ ケツゾウ コウガクケイ オ モチイタ Xセン ロコウ ソウチヨウ ア
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Abstract
A precision alignment-pattern detection method using diagonal detection optics and twodimensional image processing technique has been developed to improve the alignment accuracy of X-ray exposure systems. This method features (1) consecutive pattern detection in an exposure field, (2) capability of detecting both lateral displacement and proximity gap between a mask and a wafer using the same detection optics, and (3) reduction of detection error caused by variations in the alignment-pattern fabrication process by using broad-spectrum (Xe light) illumination. According to the simulation of expected quantizing errors in image processing, a pixel resolution of 0.18 μm has been selected to attain a detection resolution less than 0.02 μm. The detection accuracy of an experimental apparatus was investigated, checking the expected error due to variations of wafer alignment patterns, resulting in a detection accuracy of ±0.02 μm for the lateral displacement detection and ± 0.06 μm for the gap detection, respectively.
Journal
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- Journal of the Japan Society for Precision Engineering
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Journal of the Japan Society for Precision Engineering 55 (9), 1687-1693, 1989
The Japan Society for Precision Engineering
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Keywords
Details 詳細情報について
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- CRID
- 1390001204797314816
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- NII Article ID
- 110001370090
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- NII Book ID
- AN1003250X
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- ISSN
- 1882675X
- 09120289
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- NDL BIB ID
- 3245245
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed